MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647125226 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on October 21, 2026, for Method For Producing Polymer Dispersion And Method For Producing Water-Absorbing Resin Particle.
Inventor includes Sakai Yuka.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: This method for producing a polymer dispersion includes: a step for preparing a polymer solution containing a polymer in which a crosslinked structure of a water- absorbing resin has been cleaved; and a step for bringing the polymer solution into contact with a poor solvent for the polymer to deposit a solid polymer and thereby obtaining a polymer dispersion in which the solid polymer is dispersed. The transmittance of the polymer dispersion over a 1 cm optical path of light, having wavelength of 425 nm, is 0.85% or less.
Disclaimer: Curated by HT Syndication.
