MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202617070703 A) filed by Nissan Chemical Corporation on June 06, 2026, for Method For Producing Layered Body And Method For Producing Semiconductor Element.
Inventors include Saijo Taiki; Shibayama Wataru; and Furukawa Yuki.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: Provided is a method for producing a layered body having a surface modification layer and a semiconductor substrate, the method comprising: a first step for obtaining a surface modification layer precursor by coating a semiconductor substrate with a surface modifier containing a polysiloxane (A) having organic groups having nitrogen atoms and a solvent (B), and then baking the semiconductor substrate with the surface modifier thereon; and a second step for obtaining a surface modification layer having a film thickness no greater than 5 nm by inducing contact between the surface modification layer precursor and a thinning solution (X) in order to thin the surface modification layer precursor.
Disclaimer: Curated by HT Syndication.
