MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202641098193 A) filed by Indian Institute Of Technology Madras Iit Madras on August 13, 2026, for Method For Producing Large-Area Free-Standing Ultrathin Films.
Inventors include Satyesh Kumar Yadav; Daljin J; Lasya Peela; Pandiri Sirish; Seepana Pardhasaeeswara Rao; and Gandham Tirumala Siva Pavan.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: ABSTRACT METHOD FOR PRODUCING LARGE-AREA FREE-STANDING ULTRATHIN FILMS The present invention relates to a method for preparing continuous, large-area, free-standing ultrathin films. The method comprises providing a substrate (100), depositing a first metal layer (101) on the substrate (100), and depositing a second layer (102) on the first metal layer (101). The first metal layer (101) is subsequently selectively removed using a suitable removing agent, thereby releasing the second layer (102) as a continuous, large-area free-standing ultrathin film while substantially maintaining the structural integrity and continuity of the film. Figure.1
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