MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202641078045 A) filed by Anguluru Ramalakshmi on June 24, 2026, for Method For Fabrication Of A Holey Graphene-Based Antibacterial Water Purification Membrane.
Inventors include Dr. N. S. Kalyan Chakravarthy; Dr. Shaik Shaphiya; Dr. Kari Anjaiah; Anguluru Ramalakshmi; Mr. Darla Chaitanya; Dr. Bahunadam Ramana; Mr. Ramisetti Venkata Rao; Mrs. Tiyyagura Vijaya Lakshmi; Mr. Devireddy Surendhar Reddy; and Mr. P. Vishwanath.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: METHOD FOR FABRICATION OF A HOLEY GRAPHENE-BASED ANTIBACTERIAL WATER PURIFICATION MEMBRANE ABSTRACT The present invention relates to a method for fabrication of a holey graphene-based antibacterial water purification membrane and a water purification system incorporating the fabricated membrane. The invention comprises dispersing graphite powder (102) in distilled water (101), followed by ultrasonication using an ultrasonication assembly (104) within a vessel (103). The oxidized graphite material (106) obtained using potassium permanganate, perchloric acid, and nitric acid is subjected to microwave-assisted exfoliation within a microwave chamber (107) controlled through a control interface (108) to obtain graphene oxide. The graphene oxide is sequentially treated with hydrogen peroxide and hydrochloric acid to form holey graphene oxide (109) having nanoscale pores. Antimicrobial metal oxide particles (111) are dispersed in dimethyl formamide (110) and integrated with the holey graphene oxide to form a porous composite layer (116) coated on a porous support substrate (118). The resultant membrane is integrated within a membrane filtration module (123) of a water purification system for removal of microbial contaminants, heavy metals, suspended impurities, and organic pollutants from contaminated water. Figure-1
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