Intellectual Property India Publishes Patent Application for Method For Designing Geometrically Fitting And Structurally Optimized Patient-Specific Implant Models And Method For Training An Artificial Intelligence Model For Designing Geometrically Fitting And Structurally Optimized Patient-Specific Implant Models

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202617075163 A) filed by Eth Zurich; Danmarks Tekniske Universitet; and Schulthess Klinik on June 17, 2026, for Method For Designing Geometrically Fitting And Structurally Optimized Patient-Specific Implant Models And Method For Training An Artificial Intelligence Model For Designing Geometrically Fitting And Structurally Optimized Patient-Specific Implant Models.

Inventors include Smit, Thijs; Helgason, Benedikt; Aage, Niels; Ferguson, Stephen; and Haschtmann, Daniel.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: The present invention relates to a computer-implemented method (100) for designing a geometrically fitting and structurally optimized patient-specific implant model (1) in view of its manufacturing.

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