MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647108857 A) filed by Maintech Co. , Ltd. on September 10, 2026, for Method For Cleaning Papermaking Machine Component And Cleaning Device Used For Same.
Inventors include Muroya Tomonori; Murayama Koji; Suguro Hiroshige; Nagatsuka Tomohiko; Ito So; Sato Aimi; and Sekiya Hiroshi.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: [Problem] To sufficiently improve a cleaning effect of a papermaking machine component while being simple. [Solution] A papermaking machine component is at least one selected from the group consisting of: a wire (2); a felt (3); a press roll (4); a wet paper guide roll (10) for guiding wet paper (X1); a wire guide roll (20) for guiding the wire (2); a felt guide roll (30) for guiding the felt (3); a canvas (6) used when the wet paper (X1) is pressed against a dryer roll (5) at a dry part (P3); and a canvas guide roll (60) for guiding the canvas (6). While operating the papermaking machine component, cleaning water including hot water that is at least 60°C but less than 100°C or water vapor that is 100-200°C is linearly blown on the papermaking machine component from a cleaning water head (11). The distance between the papermaking machine component and an opening (11c) of the cleaning water head (11) is 0.1-30 mm.
Disclaimer: Curated by HT Syndication.
