MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202641114409 A) filed by Vallurupalli Nageswara Rao Vignana Jyothi Institute Of Engineering And Technology on September 24, 2026, for Method And System For Taguchi-Based Optimization Of Fdm 3d Printing Parameters For Petg-Cf Components.
Inventor includes Dr. V V D Sahithi.
The application for the patent was published on October 02, 2026, under issue no. 40/2026.
Abstract: ABSTRACT [0029] In today’s world, Fused Deposition Modelling (FDM) is a widely used additive manufacturing technology with prints 3D models layer by layer. However, the quality and efficiency of the 3D printers is affected by various process parameters. a literature review to identify the critical parameters such as infill density, layer height, layer thickness, printing speed etc. Next, the Taguchi technique was used to design the different parameter combinations. The material chosen for the research was PETG-CF. The chosen criteria include surface finish and tensile strength. The results obtained from the experiments are meticulously analyzed to determine the optimal combination of process parameters that yield the desired outcomes. Statistical tools and software are employed to assess the significance of individual parameters and their interactions. Additionally, the impact of optimized parameters on material consumption and printing time is considered to achieve a balanced and efficient printing process. The findings from this project provide valuable insights into the intricate relationship between process parameters and the quality of FDM-printed objects. The optimized parameters contribute to enhanced print quality, reduced production time, and improved resource utilization. This research is valuable for both novice and experienced users of FDM 3D printers, offering practical guidelines for achieving superior results in additive manufacturing applications.
Disclaimer: Curated by HT Syndication.
