MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617095830 A) filed by Aixtron Se on August 07, 2026, for Method And Device For Determining The Processability Of A Substrate.
Inventors include Mauder, Christof; Meyer, Dominik; and Debald, Arne Lars.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The invention relates to a method for treating a substrate (7) in a process chamber (8), wherein the substrate (7) is heated to an elevated temperature (t) in order to remove oxides from the surface or deposit a layer on it. According to the invention, the surface of the substrate (7) or of the layer is observed using an optical measuring device (11). Measured values are obtained and considered in relation to comparative values which have been determined during the treatment of a processable substrate. A decision value is calculated. If the decision value lies in a predetermined value range, that is to say for example below a threshold value, the processability of the substrate or of the layer is answered in the affirmative. Otherwise, a manufacturing process is aborted.
Disclaimer: Curated by HT Syndication.
