MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202521038580 A) filed by The Maharaja Sayajirao University Of Baroda; Prasanna S. Ghalsasi; and Patel Ashutosh K. on April 22, 2025, for Method And Composition For Selective Silver Deposition Using A Layered Solvent System.
Inventors include Prasanna S. Ghalsasi; and Patel Ashutosh K..
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The method involves depositing a silver film onto a substrate by creating a stratified multi-layer solvent system within a reaction vessel. This system includes an aqueous layer with a silver-ammine complex solution, a buffer layer, and a non-aqueous layer with a reducing agent solution. The process allows metal ions and reducing agent molecules to diffuse into the buffer layer, where a redox reaction occurs at a diffusion-controlled interface, resulting in the selective deposition of silver onto the substrate. The composition for this method includes a similar stratified solvent system, facilitating controlled diffusion and selective silver deposition. FIG 01.
Disclaimer: Curated by HT Syndication.
