MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202611021781 A) filed by National Institute Of Technology, Delhi; and Dr. Leeladhar Nagdeve on February 24, 2026, for Macro Electric Discharge Additive Manufacturing System And Method Using Magnetic Plasma Stabilization And Optimized Dielectric.
Inventors include Dr. Leeladhar Nagdeve; Dr. Ashok Kumar Dewangan; Mr Ganesh Singh Yadav; Narasimhudu Sreeramula; and Ankush Katheria.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: A MEDA manufacturing system and method are disclosed for high-rate, layer-by-layer fabrication of dense, three-dimensional metallic components. Conventional EDD is limited by low deposition rates, high porosity, and interfacial inhomogeneity. The MEDA system overcomes these limitations through three synergistic features: first, a magnetic field generator (204) positioned proximal to the lower surface of the substrate (202b) projects magnetic flux upward through the substrate into the discharge zone, generating a Lorentz force that stabilizes arc trajectory and induces magnetohydrodynamic stirring within the molten pool, mitigating micro-cracking, macro-segregation, and interferential inhomogeneity; second, an optimized dielectric fluid comprising SiC, Al2O3, or graphite powder additives at 2–6 g/L, delivered via dielectric delivery nozzle (205c), enhances discharge stability and debris flushing; and third, reverse-polarity operation, with consumable electrode (202a) as anode and substrate (202b) as cathode, facilitates high-volume material transfer with enhanced density and reduced porosity.
Disclaimer: Curated by HT Syndication.
