MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202621080967 A) filed by Symbiosis International Deemed University on June 30, 2026, for Integrated Ai-Driven Embroidery Learning And Creation Platform With Diy Kit.
Inventors include Nisreen Huzefa; Dr. Neetu Singh; and Shailaja Bhagwat.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: ABSTRACT INTEGRATED AI-DRIVEN EMBROIDERY LEARNING AND CREATION PLATFORM WITH DIY KIT The present invention discloses an integrated AI-driven embroidery learning and creation platform (100) combining curated physical DIY embroidery kits (200) with an intelligent web-based digital interface (110). The platform (100) features an AI-driven pattern generation module (120) with a text-to-pattern input interface (121), adaptive colour scheme engine (122), and skill-level pattern adaptation unit (123). A design-to-stitch mapping engine (220) comprising a stitch type selector (221) and stitch sequence generator (222) translates patterns into executable stitch instructions. The platform (100) includes a stitch library module (130) with video tutorials and practice sheets, a progress tracking module (150) with completion monitoring and rewards, a community interaction module (160), a global inspiration gallery (170), and workshop integration (180). A central server (210) ensures data synchronization across all modules. [
Disclaimer: Curated by HT Syndication.
