MUMBAI, India, Oct. 12 -- Intellectual Property India has published a patent application (202611104122 A) filed by Chandigarh University on August 29, 2026, for Innovative Dual-Filter Respirator Mask With Integrated Carbon And Particulate Filtration.
Inventors include Ravinder Tonk; Anuj Kumar Sehgal; Baljinder Kaur; Ritu Sharma; Navneet Kaur; Jatinder Kaur; Harmanjot Singh; Harjot Singh; Devansh Mudgill; and Sushant Kumar.
The application for the patent was published on October 09, 2026, under issue no. 41/2026.
Abstract: The present invention relates to a full-face respirator mask configured to provide respiratory, ocular, and facial protection against airborne particulates, hazardous gases, 5 vapors, and other contaminants. The respirator comprises a facepiece, a transparent visor, low-profile cheek-contoured filter modules incorporating dual-stage particulate and gas filtration media, inhalation valves, an internal airflow management arrangement, a nose cup, a downward and rearward-directed exhalation valve, a sealing member, and an adjustable head harness. The airflow management arrangement reduces breathing 10 resistance, heat accumulation, humidity, and carbon dioxide concentration while minimizing visor fogging. In an optional embodiment, an electronic monitoring module monitors environmental conditions, filter status, and breathing resistance, generates user alerts, estimates filter life, and optionally transmits operational data to external devices. The respirator provides improved ergonomics, user comfort, filtration performance, and 15 compatibility with protective equipment during industrial, emergency response, and tactical operations.
Disclaimer: Curated by HT Syndication.
