MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617094405 A) filed by Dws S. R. L. on August 04, 2026, for Improved Stereolithography Machine And Operation Method Thereof.
Inventor includes Busato, Renzo.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A stereolithography machine (1) comprising: a tank (4); a source (5) of electromagnetic radiation adapted to selectively irradiate the tank (4); a modelling platform (6), which is carried in a mobile manner along a first reference axis (A) orthogonal to the bottom (8) of the tank (4); a multifunction assembly (23) provided at least with levelling means (22), which are adapted to level the fluid substance in said tank (4), equipped with an oblong paddle (27), which extends along a second reference axis (B) orthogonal to the first reference axis (A) and is carried in a movable manner along a direction (di) orthogonal to the first reference axis (A) and the second reference axis (B), and wherein the paddle (27) is pivotally carried about a rotation axis (C) parallel to the second reference axis (B).
Disclaimer: Curated by HT Syndication.
