MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202531064284 A) filed by Indian Institute Of Technology Kharagpur on July 04, 2025, for Hyaluronic Acid Flexible Thin Films And Preparation Method Thereof.
Inventors include Chowdhury, Sayak Roy; Babu, Rosebin; Ghosh, Anupam; and Ranjan, Dr. Shivendu.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: Provided herein is a bio-adhesive hydrogel thin-film patch for dermal therapeutic applications comprising an ester-crosslinked hydrogel matrix of hyaluronic acid (HA) and carboxymethyl cellulose (CMC). The hydrogel matrix forms a flexible thin film having a thickness in the range of 200 µm to 300 µm having a nano-to-micron wrinkle-like surface morphology, thereby providing transparency, flexibility, conformability, and uniform non-invasive dermal adhesion without requiring a separate adhesive layer. The hydrogel matrix is configured to provide sustained localized release of hyaluronic acid and one or more therapeutic agents for dermal therapeutic applications including treatment of acne, dermal lesions, burns, wounds, ulcers, and infected skin regions. The hydrogel patch further exhibits substantially residue-free removal, breathability, controlled swelling characteristics, antioxidant activity, cytocompatibility, and enhanced antibacterial efficacy against Cutibacterium acnes. Further, the hydrogel patch possesses a mechanical modulus substantially comparable to that of native skin, thereby providing a safe, flexible, breathable, and conformable platform for advanced wound care and a broad range of dermal therapeutic applications.
Disclaimer: Curated by HT Syndication.
