MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647113268 A) filed by Entegris, Inc. on September 22, 2026, for High Purity Tin Compounds And Related Compositions And Related Methods.
Inventor includes Ermert, David, M..
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: Compositions comprising tin (IV) alkoxide compounds useful for extreme ultraviolet lithography are provided. The compositions comprise a highly pure tin (IV) alkoxide compound, with low levels of impurities, including, for example and without limitation, at least one of halide impurities, ammonium impurities, or any combination thereof. Halide-free methods for synthesizing the tin (IV) alkoxide compounds are also provided. Various other compositions and methods are provided.
Disclaimer: Curated by HT Syndication.
