Intellectual Property India Publishes Patent Application for High-Purity 2-Aminoethyl Methacrylate Hydrochloride, Copolymer Including Said Hydrochloride As Structural Unit, And Method For Producing 2-Aminoethyl Methacrylate Hydrochloride

MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647113764 A) filed by Nof Corporation on September 23, 2026, for High-Purity 2-Aminoethyl Methacrylate Hydrochloride, Copolymer Including Said Hydrochloride As Structural Unit, And Method For Producing 2-Aminoethyl Methacrylate Hydrochloride.

Inventors include Iwakiri Norio; Kawasaki Hiroko; and Kitamura Hiroki.

The application for the patent was published on September 25, 2026, under issue no. 39/2026.

Abstract: This method for producing 2-aminoethyl methacrylate hydrochloride comprises a reaction step for reacting aminoethanol hydrochloride and methacrylic acid chloride and a drying step for drying 2-aminoethyl methacrylate hydrochloride obtained in the reaction step at not higher than 45°C.

Disclaimer: Curated by HT Syndication.