MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202617065922 A) filed by N. T. Tao Ltd. on May 25, 2026, for High Power Plasma Switch With Active Magnetic Cut-Off Control.
Inventors include Weinfeld, Boaz; Weinfeld, Doron; and Gour Lavie, Oded.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: High fidelity plasma switch for cut-off of high voltage and/or high current power to enable the operation of high frequency high fidelity high current and substantially high voltage pulse supply of electrical power using a source of high voltage and high current; a plasma discharge device; an outlet sensor; and a control switch, wherein the plasma discharge device comprises: a vacuum chamber; a means of producing a high vacuum in said vacuum chamber; a means of introducing a gas into said vacuum chamber; inlet and outlet electrodes within said vacuum chamber posed to create a 'spark gap'; and an at least one electromagnet configured to produce a magnetic field in the vacuum chamber that cuts off plasma discharge between the electrodes.
Disclaimer: Curated by HT Syndication.
