MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202544131304 A) filed by Canon Kabushiki Kaisha on December 24, 2025, for Height Measurement Device, Exposure Apparatus, And Article Manufacturing Method.
Inventors include Naoki Funabashi; Yusuke Endo; Mizuki Narimatsu; Shigeo Koya; Yuichiro Morikuni -; and Shinzo Uchiyama.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: A height measurement device includes an optical measurement device configured to measure a height of a substrate, an air sensor configured to measure a height of the substrate while discharging air through a pipeline based on a pressure in the pipeline, a member having a reference surface, and a controller configured to correct a result obtained by measuring a height at a second measurement location on the substrate using the optical measurement device based on a first result obtained by measuring a height at a first measurement location on the substrate and a height of the reference surface using the optical measurement device and a second result obtained by measuring a height at the first measurement location on the substrate and a height of the reference surface using the air sensor. [Figure 4]
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