MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647093192 A) filed by Mitsubishi Heavy Industries, Ltd. on July 31, 2026, for Gas Treatment Facility And Gas Treatment Facility Method.
Inventors include Katsuki Masatoshi; Onuki Takuro; and Mukai Yosuke.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: This gas treatment facility comprises: a dust collection filter device; and a reactant supply machine that can supply, into gas to be recovered, a reactant capable of reacting with the gas while in powder form. The dust collection filter device is provided with: a case in which there are formed an inlet through which gas flows in and an outlet through which gas flows out; and a dust collection filter that partitions the interior of the case into an inlet-side space on the inlet side and an outlet-side space on the outlet side. The reactant supply machine can supply the reactant into the gas line or into the inlet-side space, the reactant having been subjected to desorption treatment in which the gas to be recovered that is adsorbed in response to the reactant is desorbed from the reactant.
Disclaimer: Curated by HT Syndication.
