MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202647090946 A) filed by Asml Netherlands B. V. on July 27, 2026, for Gas Flow Reallocation In Light Source.
Inventors include Frenzel, Alex, James; and Braaksma, Niels.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: An extreme ultraviolet (EUV) system includes a vessel for generating radiation, a mirror, a gas flow assembly, and an exhaust. The system provides a first gas flow path in the vessel when the system is generating EUV radiation. The system provides a second gas flow path in the vessel when the system is not generating EUV radiation. The system can switch between the first gas flow path and the second gas flow path in a few milliseconds.
Disclaimer: Curated by HT Syndication.
