Intellectual Property India Publishes Patent Application for Focus Metrology Method And Method For Designing A Focus Target For Focus Metrology

MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202647069164 A) filed by Asml Netherlands B. V. on June 02, 2026, for Focus Metrology Method And Method For Designing A Focus Target For Focus Metrology.

Inventors include Op 'T Root, Wilhelmus, Patrick, Elisabeth, Maria; Van Den Bos, Karel, Hendrik, Wouter; Hou, Zhe; and Lemmers, Dorus.

The application for the patent was published on June 12, 2026, under issue no. 24/2026.

Abstract: Disclosed is a method of metrology, comprising obtaining a first measurement parameter value relating to at least a first sub-target; obtaining a third measurement parameter value relating to at least a third sub-target; and determining at least a focus parameter from at least said first measurement parameter value, said determination being normalized using at least said third measurement parameter value. The at least third sub-target comprising a normalization sub-target comprising substantially no or minimal focus sensitivity. Also disclosed is a method for designing a focus target.

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