MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202524114368 A) filed by Carl Freudenberg Kg on November 20, 2025, for Filter Material For A Filter For High Flow Filtration.
Inventor includes Dawar Dhingra, Saru.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: ABSTRACT FILTER MATERIAL FOR A FILTER FOR HIGH FLOW FILTRATION A filter material for a filter for high flow filtration is provided comprising a filter medium, the filter medium being configured in pleats, the pleats preferably having a pleat height of at least 150 mm, and comprising a three-dimensional mat of entangled extruded polymeric filaments between layers of the filter medium of adjacent pleats, enabling to reduce the air flow resistance in the filter element as compared to a filter material comprising Aluminium spacers between layers of the filter medium of adjacent pleats.
Disclaimer: Curated by HT Syndication.
