MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202617081518 A) filed by International Business Machines on July 02, 2026, for Extra Gate Device Integration With Semiconductor Device.
Inventors include Kang, Tsung-Sheng; Li, Tao; Xie, Ruilong; and Sung, Min Gyu.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: A semiconductor structure includes a first backside source/drain region and a second backside source/drain region in a substrate, associated with an extra gate device, disposed within a backside region of the semiconductor structure.
Disclaimer: Curated by HT Syndication.
