MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202611078033 A) filed by Geeta University on June 24, 2026, for Electromagnetic Radiation-Absorbing Fabric With Nanostructured Composite Layers And Integrated Sensing System.
Inventors include Mr. Sahil Sharma; Dr. Jaskaran Singh; Ms. Ananya G; Vina Devi; Aditi Sharma; Dr. Nisha Bayal; and Dr. Yuvraj Yadav.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: A multi-functional fabric for absorbing electromagnetic radiation and monitoring exposure is disclosed. The fabric comprises a textile substrate with a multi-layer nanostructured composite of carbon nanotubes, doped metal-oxide nanosheets, and magnetic metal oxide nanoparticles, providing ultra-broadband absorption from sub- GHz to millimeter wave 5G/6G frequencies. Ultra-thin flexible electromagnetic field sensors are embedded within the fabric and communicate wirelessly with a mobile application to provide real-time exposure alerts and analytics. The textile remains lightweight, flexible, breathable, and durable, with optional silver or copper ion doping for deodorizing and antimicrobial properties. Manufacturing uses chemical vapor deposition, metamaterial embroidery, and lamination. The fabric retains 90% absorption efficiency after 20 washes and is suitable for wearable clothing, protective gear, and equipment covers.
Disclaimer: Curated by HT Syndication.
