MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202521048093 A) filed by Indian Institute Of Science Education And Research on May 19, 2025, for Electrolithography (elg) System For High-Resolution Large-Area Patterning And Method Thereof.
Inventors include Dr. Santanu Talukder; and Abhishek Kumar.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: The present invention relates to electrolithography (ELG) system for high-resolution large-area patterning and method thereof. The system 100 comprises a substrate 102, a static probe 104, a scanning probe 106, a plurality of imaging devices 108, an electro- mechanical assembly 110, a reference framework 112, a controlling unit 114, a power supply unit 116, and a closed chamber 118. The static probe 104 and scanning probe 106 function as complementary electrodes to enable localized electrochemical reactions such as oxidation or material dissolution on the substrate 102, preferably chromium thin film. The scanning probe 106 is precisely maneuvered by electro-mechanical assembly 110 based on a control signal 114a generated by controlling unit 114, using real-time imaging signals 108a and feedback parameters. The closed chamber 118 ensures a controlled environment for consistent lithographic performance. The system 100 offers a modular, scalable solution for ambient-condition electrolithography operations.
Disclaimer: Curated by HT Syndication.
