MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202611101891 A) filed by Upes, Dehradun on August 24, 2026, for Dual-Phytochemical Plga Nanoparticles In Hyaluronic Acid Hydrogel For Topical Skin Application.
Inventor includes Moulika Todaria.
The application for the patent was published on October 02, 2026, under issue no. 40/2026.
Abstract: The invention relates to topical pharmaceutical nanotechnology for localized skin cancer therapy, and provides a nano-hydrogel system comprising dual drug-loaded poly(lactic-co-glycolic acid) nanoparticles co-encapsulating ferulic acid and kaempferol, dispersed in a hyaluronic acid hydrogel. The nanoparticles are prepared by nanoprecipitation from an organic phase containing poly(lactic-co-glycolic acid), ferulic acid, and kaempferol into an aqueous polyvinyl alcohol phase, followed by sonication and solvent evaporation, and are incorporated into a 2% w/v hyaluronic acid gel containing ethanol, methylparaben, propylparaben, Tween 80, propylene glycol, and glycerine. The system provides improved physical stability, optimized particle characteristics, sustained topical release, and enhanced local delivery compared with conventional topical phytochemical formulations, and is useful for treatment of skin cancer lesions.
Disclaimer: Curated by HT Syndication.
