MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202511014094 A) filed by Shipra Rastogi on February 19, 2025, for Dual Phase Release System Comprising Microneedle Patches, Methods For Preparation And Uses Thereof.
Inventor includes Shipra Rastogi.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The present disclosure relates to a dual phase release system comprising a microneedle patch including a base layer and a plurality of dissolvable microneedles extending from the base layer. The microneedles comprise a first bioactive component dispersed within a first biocompatible polymeric matrix configured to dissolve upon insertion into skin. The base layer comprises a hydrogel matrix containing a second bioactive component dispersed within a second biocompatible polymeric matrix. The first polymeric matrix exhibits a dissolution rate faster than the dissolution or erosion rate of the second polymeric matrix, thereby enabling sequential release of bioactive components from a single integrated patch. The system is suitable for localized intradermal delivery followed by sustained topical release and may be used for dermatological therapeutic or cosmetic applications.
Disclaimer: Curated by HT Syndication.
