MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202641106120 A) filed by Sri Eshwar College Of Engineering on September 03, 2026, for Dual-Network Passive Flow Control Device With Pressure-Redistribution Chamber For Enhanced Directional Flow Resistance.
Inventors include Dr. Y. Sureshbabu; and Rohith R.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: The present invention relates to a dual-network passive flow control device with a pressure-redistribution chamber for enhanced directional flow resistance, configured to control fluid movement through fixed internal geometry without requiring movable mechanical components, external actuation or electrical power. The device comprises a fluid inlet, a fluid outlet, a first fixed-geometry flow network, a second fixed-geometry asymmetric resistance network and at least one pressure- redistribution chamber positioned between selected portions of the first and second flow networks. The first flow network is configured to provide a comparatively direct and low-resistance flow path for fluid travelling in a preferred direction, while the second flow network comprises asymmetric branch passages, bends, loops and recirculation regions configured to provide increased hydraulic resistance when fluid attempts to travel in an opposite direction. The pressure-redistribution chamber is fluidly connected to the first and seco
Disclaimer: Curated by HT Syndication.
