MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202611070150 A) filed by Noida International University on June 04, 2026, for Drought Tolerance Screening Method For Fenugreek Genotypes.
Inventors include Shailesh Solanki; Jyoti Chauhan; Rakesh Srivastava; and Rahul Kumar Singh.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: The invention relates to a morpho-physiological screening method for drought tolerance in fenugreek genotypes. Fenugreek productivity is reduced by drought stress, particularly during flowering and pod formation. The method comprises cultivating fenugreek genotypes under well-watered and drought-stressed conditions, recording observations at flowering and pod formation stages, and measuring plant height, Relative Water Content, Membrane Stability Index, chlorophyll content, carotenoids, proline accumulation, and seed yield. The data are analysed using ANOVA and correlation analysis to classify drought-tolerant genotypes. Genotypes having higher RWC, MSI, chlorophyll content, and seed yield under drought are identified as drought-tolerant, including Rmt-1 and Rmt-305. The method is useful for crop improvement programs, agricultural research stations, seed-development programs, breeders, and cultivation planning in water-limited regions.
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