MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202641100133 A) filed by Saveetha Institute Of Medical And Technical Sciences on August 19, 2026, for Digital Margin Gap Predictor.
Inventors include Keshav Rajesh; Harini K; and Deepak Nallaswamy Veeraiyan.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: A software algorithm that analyzes a digital tooth preparation and selected crown material (PEEK, Titanium, or Zirconia) to simulate long-term fatigue and wear, predicting the location and magnitude of potential marginal gap formation over a 5-10 year period. The system accepts multiple clinician inputs — including a 3D scan of the tooth preparation, crown material selection, patient occlusal bite force data, and cement type — and generates a color-coded 3D risk map, a numerical risk score, and design modification suggestions. The software functions as both a standalone application and as a plugin module compatible with existing dental CAD platforms. This allows for proactive design modifications before the crown is fabricated, enhancing restoration longevity and reducing prosthetic failure rates.
Disclaimer: Curated by HT Syndication.
