MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202511016008 A) filed by Indian Institute Of Technology Jammu on February 24, 2025, for Device For Measuring Evaporation Rates Using Resistance Change.
Inventors include Harshit; Chauhan, Shivani; and Kumar, Navneet.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: The present invention provides a device for measuring evaporation and transpiration rates, comprising: a porous surface (102, 202) configured to hold liquid; a plurality of conductive elements (104b, 204b) positioned in the opposite slots provide inside the small liquid reservoir; a microcontroller (106, 206) operatively connected to the conductive elements and configured to detect changes in liquid level over time based on signals from the conductive elements, calculate evaporation and transpiration rates based on the detected changes in liquid level by measuring resistance changes as the liquid level changes, and output the calculated rates to an output unit (108, 208); and the output unit operatively connected to the microcontroller. The device may have two configurations: one with a liquid reservoir column fluidly connected to the porous surface, and another with an external large liquid reservoir connected to a small liquid reservoir column through a siphon tube.
Disclaimer: Curated by HT Syndication.
