MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202641126705 A) filed by Iniciotek Private Limited on October 23, 2026, for Device For Generating A Sweeping Plasma Arc For Gas Ionization And Method Thereof.
Inventors include Jaji Vijayaraman; Tharun Jaji; and Ramkishore Pr.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention discloses a device for generating a sweeping plasma arc for gas ionization. The device (100) includes a plasma generation unit (104) comprising a zero-voltage switching unit (106) to generate an output voltage comprising a pulsed direct-current waveform from an input power supplied by a power supply unit. A fly-back transformer unit (108) to generate a high-voltage output and a capacitor unit (110) to stabilize the high-voltage output into a steady pulsed direct-current voltage. The device includes a plasma ionization chamber unit (112) configured to generate a plasma arc and is repeatedly displaced among a plurality of tooth-like projections to generate a sweeping plasma arc in each of the plurality of quadrants, the sweeping plasma arc establishing a plasma energy field within each of the plurality of quadrants, a target gas (122) resides within the plasma energy field for a predetermined residence time, thereby ionizing the target gas. FIG. 1
Disclaimer: Curated by HT Syndication.
