MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617073461 A) filed by Syensqo Specialty Polymers Usa, LLC; and Le Centre National De La Recherche on June 12, 2026, for Depolymerization Of Poly(ethersulfone).
Inventors include Pollino, Joel; Guelen, Simon; Batt, Frdric; Jouvin, Kvin Number; Schanen, Vincent; Kapelyushko, Valeriy; Dufaud, Vronique; Monteil, Vincent; Raynaud, Jean; Liotier, Johan; and Guerdener, Bruno.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: A process for depolymerizing a polymer material, the process comprising: forming, in a reactor vessel, a reaction medium comprising DMSO, water, an alkali compound being NaOH, and at least one PES polymer comprising at least 80 mol% of recurring units of formula (I) based on the total amount of moles of recurring units in the PES polymer; and reacting the at least one PES polymer with the alkali compound to form a depolymerized material comprising bisphenol S of formula (II), with a yield of at least 90% of bisphenol S, said yield being defined as the molar percent of bisphenol S in the depolymerized material based on the initial molar amount of PES polymer added to the reaction vessel. The volumetric ratio of DMSO/water in the reaction medium is preferably at least 10:1 and at most 150:1, and the alkali compound amount is preferably at least 2 Eq. and at most 7 Eq. based on the initial molar anount of the PES polymer present in the reaction medium.
Disclaimer: Curated by HT Syndication.
