MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202641114736 A) filed by Aditya Institute Of Technology And Management on September 24, 2026, for Defect-Engineered Hierarchical Nanomaterial With Adaptive Surface Chemistry For Selective Molecular Recognition And Chemical Sensing.
Inventors include Dr. Pothumahanthi H K Charan; Dr. Ramanaiah Malla; and Dr. Sattaru Gouthamsri.
The application for the patent was published on October 02, 2026, under issue no. 40/2026.
Abstract: ABSTRACT: Title: Defect-Engineered Hierarchical Nanomaterial with Adaptive Surface Chemistry for Selective Molecular Recognition and Chemical Sensing The present invention relates to a defect-engineered hierarchical nanomaterial comprising a nanoscale structural framework, controlled structural defects, hierarchical pores and/or transport pathways, and adaptive surface chemistry for selective molecular recognition and chemical sensing. The structural defects provide chemically active sites, while the hierarchical architecture facilitates transport of target molecules toward accessible recognition regions. The adaptive surface chemistry comprises functional groups, ligands, receptors, polymers, or molecular recognition species configured to selectively interact with a target analyte and, in certain embodiments, modify surface properties in response to environmental conditions. The nanomaterial may be incorporated into electrical, electrochemical, optical, capacitive, resistive, gravimetric, or other sensing platforms. Interaction with a target analyte produces a measurable physical or chemical response that is processed to determine analyte presence, identity, or concentration. The invention provides improved selectivity, active-site accessibility, analyte transport, sensing response, and regeneration capability.
Disclaimer: Curated by HT Syndication.
