MUMBAI, India, June 22 -- Intellectual Property India has published a patent application (202641070088 A) filed by Society For Innovation And Development; and Ministry Of Heavy Industries on June 04, 2026, for Cryogenic Grinding Chamber And Method For Manufacturing Thereof.
Inventors include Kh, Thulasi Raman; Diwakar, J. E.; and Behera, Upendra.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: A cryogenic grinding chamber (100) includes a chamber body defining an internal chamber volume, a single wall (312) separating the internal chamber volume from an external environment, an integrated combined-flow inlet formed in the chamber body and configured to receive a cryogenic gas and a polymeric material through a common inlet passage into the internal chamber volume, one or more mounting interfaces formed in the chamber body and configured to receive a grinding mechanism extending into the internal chamber volume, and an anti-adhesion surface coating disposed on at least a portion of an internal surface of the chamber body. A method for manufacturing the cryogenic grinding chamber (100) includes forming the chamber body with the single wall (312), forming the integrated combined-flow inlet, forming the mounting interfaces, and providing the anti-adhesion surface coating on the internal surface.
Disclaimer: Curated by HT Syndication.
