MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202647088676 A) filed by Koninklijke Philips N. V. on July 21, 2026, for Cooling For X-Ray System Having At Least Two X-Ray Sources.
Inventors include Reusch, Tobias; Mandelik Stern, Alexander; Psilopoulos, Jannis; and Zhao, Jincheng.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The invention relates to a cooling system (100) for an X-ray system (102) having at least two X-ray sources. The cooling system comprises a cooling unit (120) configured to provide a total flow (230) of cooling medium for cooling the X-ray source (110) and a further X-ray source (210); a flow divider (220) configured to divide the total flow (230) of cooling medium between a partial flow (231) towards the X-ray source (110) and a further partial flow (232) towards the further X-ray source (210); and a controller (150) for controlling the cooling unit (120). The controller is configured to receive a stand-by trigger signal, and in response to the stand- by trigger signal, control the cooling system (100) to adapt the partial flow (231) to provide a stand-by cooling flow towards the X-ray source (110) at a stand-by flow rate; and to receive an application trigger signal, and in response to the application trigger signal, control the cooling system (100) to adapt the partial flow (231) to provide an application cooling flow towards the X-ray source (110) at an application flow rate. The application flow rate of the application cooling flow is larger than a the stand-by flow rate of the stand-by cooling flow. The invention also relates to an X-ray system comprising the cooling system, a method for cooling an X-ray source of an X-ray system, a computer program element, and a computer-readable medium.
Disclaimer: Curated by HT Syndication.
