MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202617070675 A) filed by Nissan Chemical Corporation on June 05, 2026, for Composition For Forming Silicon-Containing Underlayer Film.
Inventors include Shibayama Wataru; Furukawa Yuki; and Saijo Taiki.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: This composition for forming a silicon-containing underlayer film is used for forming a silicon-containing underlayer film on which a surface-modified layer having a film thickness of 5 nm or less is formed. Said composition contains an [A] component that is a polysiloxane including a Q unit in the amount of 30 mol% or more relative to all units, and a [B] component that is water, but said composition does not contain a [C] component that is a curing catalyst.
Disclaimer: Curated by HT Syndication.
