MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202617078541 A) filed by Nissan Chemical Corporation on June 25, 2026, for Composition For Forming Resist Underlayer Film.
Inventors include Tanaka Takumi; Nishita Tokio; and Endo Yuki.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: This composition for forming a resist underlayer film contains: a polymer having a unit structure represented by formula (1); and a solvent. (In formula (1), A each independently represents a hydrogen atom, a methyl group, or an ethyl group, and Q1 and Q2 each independently represent a divalent group having an aromatic hydrocarbon ring. X1 and X2 each independently represent a single bond or -C(=O)-.)
Disclaimer: Curated by HT Syndication.
