MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202617083546 A) filed by Nissan Chemical Corporation on July 07, 2026, for Composition For Forming Coating Film For Foreign Substance Removal, And Semiconductor Substrate.
Inventors include Kamibayashi Satoshi; Moriya Shunsuke; and Kishioka Takahiro.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: Provided is a composition for forming a coating film for foreign substance removal, the composition containing a polymer and a solvent, and making it possible to form a coating film that can be removed by a remover liquid, wherein the polymer contains a structural unit expressed by formula (1). [In formula (1), R1 represents a hydrogen atom or a C1-3 alkyl group, R2 represents a hydrogen atom or a C1-4 alkyl group, and R3 represents an optionally substituted C1-10 alkyl group or an optionally substituted aromatic hydrocarbon group. R2 and R3 may form a ring together with a carbon atom and an oxygen atom between R2 and R3, and the ring may contain a heteroatom other than the oxygen atom.]
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