MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202514101630 A) filed by Toray Advanced Materials Korea Inc. on October 22, 2025, for Composition For Forming Anion Exchange Polymer, Anion Exchange Membrane And Method Of Manufacturing Anion Exchange Membrane.
Inventors include Ji Hwan Kim; Hye Ji Lee Republic Of; and Sang Woo Jin.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: Provided are a composition for forming an anion exchange polymer, the composition including a first monomer represented by Formula A and a crosslinking agent represented by Formula B, an anion exchange membrane including a crosslinked product thereof, and a method of producing an anion exchange membrane. Formula A Formula B Detailed descriptions of Formulae A and B are provided in the present specification.
Disclaimer: Curated by HT Syndication.
