MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202511007797 A) filed by Dinex As; and Ashok Leyland Ltd on January 30, 2025, for Compact Evaporation And Mixing Device.

Inventors include Toni Eero Mikael Korhonen; Jim Elkjaer Bebe; Mahipat Balwant Ranawat; Rasmus Mller Mrtensson; Sasikumar Kaliyamurthy; Krishnan Sadagopan; and Sanjay Chandrasekaran.

The application for the patent was published on August 14, 2026, under issue no. 33/2026.

Abstract: The present invention relates to a liquid evaporation and gas mixing device for an exhaust gas after-treatment system, the device is for mixing an exhaust gas stream from an internal combustion engine with a liquid reductant, the device comprising a housing that defines a longitudinal axis and having an upstream inlet receiving the exhaust gas stream and a downstream outlet distributing the mixed exhaust gas stream and evaporated reductant, and which comprises a first mixing chamber adapted to swirl the exhaust gas stream inside the chamber and having at least one inlet for receiving the exhaust gas stream and at least one outlet, a second mixing chamber adapted to swirl the exhaust gas stream inside the chamber and having at least one inlet for receiving the exhaust gas stream and at least one outlet, a dosing module for spraying a liquid reductant into the first chamber or the second chamber or both first and second chamber for evaporation and mixing with the exhaust gas stream, a third mixing chamber in communication with the at least one outlet of the first mixing chamber and in communication with the at least one outlet of the second mixing chamber and having at least one outlet for distribution of the exhaust gas stream mixed with the evaporated reductant, and a baffle located downstream from the upstream inlet and in communication with the at least one outlet of the third mixing chamber, and optionally in communication with the at least one inlet of the first and/or second mixing chamber, wherein the baffle comprises at least one opening configured to allow exhaust gas to bypass the third mixing chamber and optionally the first and/or second mixing chamber through the at least one opening, wherein the at least one opening is configured to allow exhaust gas to pass through the at least one opening without substantial deflection of the exhaust gas

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