MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647092416 A) filed by Cymer, LLC on July 30, 2026, for Capacitor System For A Radiation Source Of A Lithographic Apparatus.
Inventors include Xiang, Xun; and Luo, Edward, Siqi.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: A lithographic apparatus includes a projection system and an illumination system that includes an electrode and a set of capacitance structures. The electrode has an elongate shape. A length-wise strip of the electrode is defined from a first end of the elongate shape to a second end of the elongate shape. The length-wise strip includes electrical coupling positions including a first end coupling position proximal to the first end, a second end coupling position proximal to the second end, and a series of intermediary coupling positions between the first end coupling position and the second end coupling position. Each capacitance structure of the first set is coupled to a respective one of the electrical coupling positions. A capacitance value of a capacitance structure coupled to one of the intermediary coupling positions is less than a capacitance value of a capacitance structure coupled to the first end coupling position.
Disclaimer: Curated by HT Syndication.
