MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202647112917 A) filed by Toyobo Co. , Ltd. on September 21, 2026, for Base Material Film For Forming Inorganic Thin Film Layer, And Multilayer Film.
Inventors include Kitaguchi,fumiya; Yamazaki,atsushi; and Imai,toru.
The application for the patent was published on October 02, 2026, under issue no. 40/2026.
Abstract: Provided is a base material film for forming an inorganic thin film layer, wherein: a surface treatment is performed on at least one surface of a base material film that contains a polypropylene-based resin as a main component; with respect to contact angle with water of the base material film, the ratio (C1/C2) of the contact angle (C1) with water of an untreated surface to the contact angle (C2) with water of a treated surface is 1.4 or more; and the ten-point average roughness (Rzjis) of the surface of the base material film is 15 nm or less.
Disclaimer: Curated by HT Syndication.
