MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202641095620 A) filed by Vel Tech Rangarajan Dr. Sagunthala R&d Institute Of Science And Technology on August 07, 2026, for Automated Shoe Surface Assessment And Polishing System.
Inventors include Dr. K. Sudharson; Manchala Ravi Chandu; Sumanth Midde; and Ganapavarapu Sri Valli.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: Abstract Automated Shoe Surface Assessment and Polishing System An adaptive shoe surface assessment and polish optimization system is disclosed for automatically evaluating shoe characteristics and optimizing polishing operations. The system comprises a shoe detection module, a shoe surface assessment module, an adaptive parameter optimization module, a polishing execution module, and a controller configured to generate an optimized polishing profile based on assessed operating parameters including shoe colour, surface condition, contamination level, and polishing requirement. The controller dynamically determines polish selection, dispensing quantity, dispensing duration, brush operating sequence, and polishing cycle duration prior to and during polishing. An operational feedback mechanism enables adaptive modification of polishing parameters to improve polishing consistency while reducing polish consumption, unnecessary mechanical wear, and operating time. The operating-state-based optimization architecture provides a technical improvement over conventional fixed-sequence shoe polishing machines by enabling individualized polishing profiles for different shoe conditions using an embedded automated control system.
Disclaimer: Curated by HT Syndication.
