MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202541000993 A) filed by Jeyavishnu K on January 05, 2025, for Automated Resistance-Based Vial Identification Photometric System.
Inventors include Jeyavishnu K; and Manish Malhan.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: ABSTRACT Automated Resistance-Based Vial Identification photometric System The present invention discloses a method for identifying and quantifying analyte concentration in a sample using a resistance-based vial identification system. Each vial contains a resistance material [102] positioned at a non-light path location to influence its electrical resistance. Upon insertion into a sample holder [103], the system detects voltage or current variations in the circuit formed by the resistance material, identifying the vial. The resistance value triggers the selection of a corresponding analyte quantification protocol. The resistance material [102], made from a conductive substance, consists of two segments [102a][102b], and the system measures the voltage or current based on Ohm's Law (V=IR). A processing unit [107] compares the resistance data with stored vial profiles [108] to identify the vial. The analyte quantification involves photometric analysis using a light source [109] and detector [110], with the concentration determined by light absorbance. The system includes a user interface [111] for real-time monitoring and dynamic calibration.
Disclaimer: Curated by HT Syndication.
