MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647107237 A) filed by Entegris, Inc. on September 07, 2026, for Area Selective Deposition Of Aluminum Based Films Using Alkyl Aluminum Amidinate Precursors.
Inventor includes Hood, Drew Michael.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: Area selective deposition of aluminum-based films using alkyl aluminum amidinate precursors and methods thereof are provided. Area selective deposition comprises depositing an alkyl aluminum amidinate precursor on a substrate with a first surface portion comprising a metal and a second surface portion comprising a non-metal to form an aluminum-based film on the substrate. The aluminum-based film will be located on the second surface portion of the substrate and when the aluminum-based film is located on the first surface portion, a ratio of an average thickness of the film on the first surface portion to an average thickness of the film on the second surface portion is less than 1.
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