MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202647066630 A) filed by Oerlikon Surface Solutions AG, Pfffikon on May 27, 2026, for Arc Source For Homogeneous Removal Of The Target Surface.
Inventor includes Hagmann, Juerg.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: The present invention relates to an arc evaporation source, comprising a target (1) to be operated as cathode, comprising material to be evaporated, the target (1) exhibiting a target front surface (10), a target back surface (20) and a target lateral surface (30), where the target lateral surface (30) extends from the border of the target front surface (10) to the border of the target back surface (20) and the distance between the target front surface (10) and the target back surface (20) along a respective perpendicular axis (A-A) corresponds to the target thickness, an electrode as anode (70) having an inner surface for acting as electron receiving surface, a magnetic guidance system comprising means (100) for creating magnetic fields comprising magnetic field lines located in front of the target front surface (10), and confinement means (50) placed at least partially surrounding the target lateral surface (30).
Disclaimer: Curated by HT Syndication.
