MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617094776 A) filed by Agc Inc. on August 05, 2026, for Aqueous Dispersion, Method For Producing Aqueous Dispersion, And Method For Producing Polymer- Containing Substrate.
Inventors include Abe Kaori; Shibasaki Kosuke; Otsugu Satoshi; and Taguchi Daisuke.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Provided are: an aqueous dispersion capable of forming a coating film with suppressed coloration; a method for producing an aqueous dispersion; and a method for producing a polymer-containing substrate. This aqueous dispersion comprises: a first fluorine-containing polymer which has at most 1,000 ionic functional groups per 106 main-chain carbon atoms of the polymer, has a glass transition temperature of at most 10ºC, and contains a fluorine atom; a second fluorine-containing polymer which is polytetrafluoroethylene; a surfactant which includes a nonionic surfactant; and an aqueous medium, wherein said aqueous dispersion is substantially free of a fluorine-containing polymer which is different from the first fluorine-containing polymer and which has an ionic functional group.
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