MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647087006 A) filed by Hanwha Solutions Corporation on July 16, 2026, for Apparatus For Absorbing Residual Silicon, Apparatus For Growing Silicon Ingot With Same, And Method For Removing Residual Silicon From Crucible.
Inventors include Pang, Il Sun; Park, Hyung Ju; Kim, Yang Kyu; Kim, Sang Woong; Han, Sang Beom; Choi, Jae Hyoung; Lee, Young Hwan; Lee, Sung Gu; Park, Gwan Yong; Cho, Dong Je; Kim, Chang Yeon; Shin, Sung Sub; Jeong, Beom Su; Cheon, Byeong Cheol; Kim, Jung Min; Jang, Jung Gil; Jeong, Sang Gyun; Lee, Gwang Hun; Lee, Young Min; and Jeon, Han Woong.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: Disclosed are an apparatus for absorbing residual silicon, a silicon growing apparatus including same, and a method for removing residual silicon. The disclosed apparatus for absorbing residual silicon comprises: a silicon absorber; an absorber support unit for supporting the silicon absorber; and a driving unit for moving the absorber support unit so that the silicon absorber moves between a standby position spaced apart from liquid silicon accommodated in a crucible and an absorption position immersed in the liquid silicon.
Disclaimer: Curated by HT Syndication.
