MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647092333 A) filed by Henkel AG & Co. Kgaa on July 30, 2026, for Anti-Static Photocurable Adhesive Composition.
Inventors include Luo, Cuirui; Shi, Zheng; Li, Mingxin; Hu, Xiaolong; Zhao, Bin; and Zhang, Weihao.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: An anti-static photocurable adhesive composition is provided,which comprising (A) at least one acrylic oligomer having a repeating unit - (C 4H 8O) n –in the backbone, wherein n is a number of more than 2, (B) at least one mono-functional (meth) acrylate monomer, (C) at least one photo-initiator, and (D) at least one carbon nanotube.
Disclaimer: Curated by HT Syndication.
